segunda-feira, outubro 2, 2023

Examine demonstrates atomic layer deposition path to scalable, electronic-grade van der Waals tellurium skinny movies

Atomic layer deposition route to scalable, electronic-grade van der Waals Te thin films
Scalability, controllability, and homogeneity of atomic layer deposited tellurium (ALD-Te). Credit score: UNIST

A analysis group, led by Professor Joonki Suh within the Division of Supplies Science and Engineering and the Graduate Faculty of Semiconductor Supplies and Units Engineering at UNIST, has made a big breakthrough in skinny movie deposition expertise. By using an revolutionary atomic layer deposition (ALD) course of, Professor Website positioning efficiently achieved common association of tellurium (Te) atoms at low temperatures as little as 50 levels Celsius.

The ALD technique is a cutting-edge skinny movie course of that allows exact stacking of semiconductor supplies on the atomic layer degree on three-dimensional constructions—even at low course of temperatures. Nonetheless, conventional software to next-generation semiconductors requires excessive processing temperatures above 250 levels Celsius and extra warmth remedy exceeding 450 levels Celsius.

On this analysis, the UNIST group utilized ALD to monoelemental van der Waals tellurium—a cloth beneath intensive investigation for its potential purposes in and thermoelectric supplies.

Remarkably, they efficiently fabricated high-quality Te skinny movies with none post- warmth remedy at an unprecedentedly low temperature of solely 50 levels Celsius. The ensuing movies exhibited distinctive uniformity with exactly managed thickness all the way down to nanometers scale—attaining excellent atom association with one out of each billion atoms.

To boost reactivity at decrease temperatures, the analysis group employed two precursors with acid-base properties. Moreover, they launched co-reactants to enhance floor reactions and stability whereas adopting a repeating dosing approach by injecting precursors in shorter intervals. These methods enabled the manufacturing of dense and steady Te skinny movies in comparison with standard strategies that always resulted in porous or discontinuous grain depositions.

The developed manufacturing course of allowed for wafer-scale progress on complete 4-inch (100mm) wafers, offering exact atomic layer-level thickness management and uniform deposition. Moreover, the Te demonstrated compatibility with vertical three-dimensional constructions—an important requirement for prime gadget integration. This breakthrough holds vital potential for varied digital gadgets reminiscent of transistors, rectifiers, and choice components.

“This analysis fulfills all of the important standards of low-temperature, large-area, and high-quality synthesis in semiconductor deposition processes,” said Professor Suh.

The outcomes of this analysis have been revealed in ACS Nano.

Extra info:
Changhwan Kim et al, Atomic Layer Deposition Path to Scalable, Digital-Grade van der Waals Te Skinny Movies, ACS Nano (2023). DOI: 10.1021/acsnano.3c03559

Examine demonstrates atomic layer deposition path to scalable, electronic-grade van der Waals tellurium skinny movies (2023, September 18)
retrieved 19 September 2023

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